Vacatures 1 tot 10 van 14
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EUV Source Laser - Integration Architect
Asml - Veldhoven
solutions that meet business requirements. . The department EUV D&E (Development & Engineering) Source Laser is responsible for delivering the specification, design, integration and validation of the Laser system which is a key part- Volledige vacature bekijken
EUV Source Laser Integrator - Optical Platform
Asml - Veldhoven
solutions that meet business requirements. . The department ED EUV DE Source Laser is responsible for delivering the specification, design, integration and validation of the (CO2) Laser system which is a key part of the EUV Source - Volledige vacature bekijken
Diagnostics and Infrastructure engineer
Asml - Veldhoven
and see the daily impact your work creates for ASML? Then we have an exciting opportunity in the EUV Source Laser department. . Context of the position ASML’s Development & Engineering sector is responsible for the- Volledige vacature bekijken
3 MacGillavry and Lovelace Fellowships for group lea...
Arcnl - Amsterdam
context of technologies for (nano)lithography, primarily for the semiconductor industry. ARCNL has : Materials (3 groups), ( EUV ) Source (3 groups), and Metrology (5 groups) and has about 100 employees in total. ARCNL is looking- Preview - Opslaan
PhD Hydrodynamics of droplet-laser interaction for E...
Academic Positions - Amsterdam
MOORELIGHT is to deliver the missing insight. Project goal The EUV -emitting laser -produced plasmas are generated from tin targets carefully shaped (hydrodynamically deformed) by a series of laser “pre-pulses”. The ability to- Opslaan
3 MacGillavry and Lovelace Fellowships for group lea...
Uva - Amsterdam
nano)lithography, primarily for the semiconductor industry. ARCNL has : Materials (3 groups), ( EUV ) Source (3 groups), and Metrology (5 groups) and has about 100 employees in total. ARCNL is looking for three group- Preview - Opslaan
3 MacGillavry and Lovelace Fellowships for group lea...
Uva - Amsterdam
in the context of technologies for (nano)lithography, primarily for the semiconductor industry. ARCNL has : Materials (3 groups), ( EUV ) Source (3 groups), and Metrology (5 groups) and has about 100 employees in total- Preview - Opslaan
PhD Imaging Spectroscopy for Broadband EUV Source Si...
Arcnl via Academic Positions - Amsterdam
position is part of a Holland High Tech (TKI HTSM) grant titled “Imaging Spectroscopy for Broadband EUV Source Size Characterization (ImSpec)”, a collaboration between the Advanced Research Center for Nanolithography (ARCNL) and- Preview - Opslaan
PhD Hydrodynamics of droplet-laser interaction for E...
The interface between fundamental physics via Academic Positions - Amsterdam
MOORELIGHT is to deliver the missing insight. Project goal The EUV -emitting laser -produced plasmas are generated from tin targets carefully shaped (hydrodynamically deformed) by a series of laser “pre-pulses”. The ability to- Preview - Opslaan
Diagnostics and Infrastructure engineer
Asml via Adzuna - Veldhoven
and see the daily impact your work creates for ASML? Then we have an exciting opportunity in the EUV Source Laser department. . Context of the position ASML’s Development & Engineering sector is responsible for the- Opslaan
EUV Source Laser - Integration Architect
Asml via Adzuna - Veldhoven
solutions that meet business requirements. . The department EUV D&E (Development & Engineering) Source Laser is responsible for delivering the specification, design, integration and validation of the Laser system which is a key part- Opslaan
EUV Source Laser Integrator - Optical Platform
Asml via Adzuna - Veldhoven
solutions that meet business requirements. . The department ED EUV DE Source Laser is responsible for delivering the specification, design, integration and validation of the (CO2) Laser system which is a key part of the EUV Source - Opslaan
3 MacGillavry and Lovelace Fellowships for group lea...
VU Amsterdam via Talent - Amsterdam
fundamental physics and chemistry in the context of technologies for (nano)lithography, primarily for the semiconductor industry. ARCNL has three departments: Materials (3 groups), ( EUV ) Source (3 groups), and Metrology (5 groups) and- Opslaan