Vacatures 1 tot 10 van 24
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EUV Source Laser - Integration Architect
Asml - Veldhoven
solutions that meet business requirements. . The department EUV D&E (Development & Engineering) Source Laser is responsible for delivering the specification, design, integration and validation of the Laser system which is a key part- Volledige vacature bekijken
EUV Source Laser Integrator - Optical Platform
Asml - Veldhoven
solutions that meet business requirements. . The department ED EUV DE Source Laser is responsible for delivering the specification, design, integration and validation of the (CO2) Laser system which is a key part of the EUV Source - Volledige vacature bekijken
Olympia - Veldhoven
Bedrijfsomschrijving De organisatie waar jij gaat werken is gespecialiseerd in las en plaatwerk op maat. Jij gaat werken op locatie Veldhoven. Functieomschrijving Je bent als CNC laser operator werkzaam aan een van de laser - Volledige vacature bekijken
3 MacGillavry and Lovelace Fellowships for group lea...
Arcnl - Amsterdam
context of technologies for (nano)lithography, primarily for the semiconductor industry. ARCNL has : Materials (3 groups), ( EUV ) Source (3 groups), and Metrology (5 groups) and has about 100 employees in total. ARCNL is looking- Preview
PhD Imaging Spectroscopy for Broadband EUV Source Si...
Arcnl via Academic Positions - Amsterdam
Activities This fully funded PhD position is part of a Holland High Tech (TKI HTSM) grant titled “Imaging Spectroscopy for Broadband EUV Source Size Characterization (ImSpec)”, a collaboration between the Advanced Research Center- Preview
PhD Hydrodynamics of droplet-laser interaction for E...
Academic Positions - Amsterdam
MOORELIGHT is to deliver the missing insight. Project goal The EUV -emitting laser -produced plasmas are generated from tin targets carefully shaped (hydrodynamically deformed) by a series of laser “pre-pulses”. The ability to3 MacGillavry and Lovelace Fellowships for group lea...
Arcnl via Onderzoekers - Amsterdam
industry. ARCNL has : Materials (3 groups), ( EUV ) Source (3 groups), and Metrology (5 groups) and has about 100 employees in total. ARCNL is looking for three group leaders, with either experimental or modelling/theoretical- Preview
3 MacGillavry and Lovelace Fellowships for group lea...
Uva - Amsterdam
nano)lithography, primarily for the semiconductor industry. ARCNL has : Materials (3 groups), ( EUV ) Source (3 groups), and Metrology (5 groups) and has about 100 employees in total. ARCNL is looking for three group- Preview
3 MacGillavry and Lovelace Fellowships for group lea...
Uva - Amsterdam
in the context of technologies for (nano)lithography, primarily for the semiconductor industry. ARCNL has : Materials (3 groups), ( EUV ) Source (3 groups), and Metrology (5 groups) and has about 100 employees in total- Preview
3 MacGillavry and Lovelace Fellowships for group lea...
Arcnl via Academic Positions - Amsterdam
nano)lithography, primarily for the semiconductor industry. ARCNL has : Materials (3 groups), ( EUV ) Source (3 groups), and Metrology (5 groups) and has about 100 employees in total. ARCNL is looking for three group leaders- Preview
EUV Source Laser Integrator - Optical Platform
Asml via Adzuna - Veldhoven
solutions that meet business requirements. . The department ED EUV DE Source Laser is responsible for delivering the specification, design, integration and validation of the (CO2) Laser system which is a key part of the EUV Source EUV Source Laser - Integration Architect
Asml via Adzuna - Veldhoven
solutions that meet business requirements. . The department EUV D&E (Development & Engineering) Source Laser is responsible for delivering the specification, design, integration and validation of the Laser system which is a key part